Desktop Plasma Asher is is our entry level plasma treatment system, features of a larger circular aluminium vacuum chamber that is 280mm in diameter and with a direct powered RF electrode for processing.

When fitted with a high power RF source (13.56 MHz), the NE-PE13F is a popular choice for use as a plasma asher. Although all of our systems are versatile and can perform many tasks without changing configuration settings, the NE-PE13F is the best value in the industry for plasma ashing; the process of removing photoresist from an etched wafer. When fitted with a lower power RF source (200W), the system also excels at plasma cleaning and surface modification applications.

Features

• Durable Welded Round Aluminium Vacuum Chamber

• Chamber Dimensions: 280mm Diameter x 240mm Deep
  

• Optional high power 13.56MHz Supply

• PLC Microprocessor Control System

• Keypad user interface with alphanumeric display

• Storage of one Process Recipe

• Automatic Process Sequencing