The NE-PE05 is a space-efficient laboratory-grade plasma system specifically designed for surface activation applications. It is widely adopted by research institutes, corporate R&D centers, and low-volume manufacturing facilities.

Utilizing advanced Capacitively Coupled Plasma (CCP) technology, the system integrates a complete vacuum processing setup comprising a stainless steel cylindrical chamber, RF plasma generator, vacuum pumping system, and precision gas flow controls. The robust chamber construction ensures long-term durability and stable process performance.

Engineered to enhance substrate adhesion strength and optimize surface wettability, the NE-PE05 supports diverse applications including material bonding, functional coating, thin-film deposition, and precision assembly processes.

Applications

• Plasma cleaning organics

• Plasma surface activation to improve adhesion

• PDMS & microfluidic devices

• PEEK & other engineering polymers

• PTFE

• Metals

• Ceramics

• Glass & optical devices