DESCRIPTION
NE-PE05 is a mini labortorial plasma surface activator widely used in scientific research institutions, enterprise research and development units, and small-scale production. The equipment adopts the CCP capacitor coupled plasma generation method, and the entire system includes a vacuum chamber, plasma generator, vacuum pump, and inlet and outlet ports. The processing chamber is made of cylindrical stainless steel material. It can be used to improve the adhesion or hydrophilicity of the substrate surface, and has a wide range of applications in material bonding, coating, substrate coating, or bonding.
Applications
Cleaning: removing organic matter, oxides, metal salts, nanoscale particulate pollutants, etc;
Activation: hydrophilic and hydrophobic modification, surface energy enhancement, functional group introduction, biocompatibility improvement, etc;
Etching: Surface patterning, surface micro etching, changing surface morphology and roughness, etc;
Bonding: Bonding of microfluidic devices such as PDMS;
Degassing: photoresist ashing, bottom film scanning.
Plasma cleaning technology utilizes the low-temperature plasma characteristics to allow the plasma to come into contact and react with the material surface, resulting in chemical and physical cleaning of the treated material surface, improving surface wettability, or implanting new chemical functional groups and surface etching.
PARAMETER
Technical Specifications | |
NE-PE05 Low Pressure Plasma Treatment Systems | |
ENCLOSURE | |
Dimensions | 590mm(L)×565mm(W) ×470 mm(H) |
PLASMA POWER SUPPLY | |
Mains voltage and frequency | 220 VAC 50/60 Hz |
Output voltage/plasma power | 0-300W (adjustable) |
PROCESS CONTROL | |
Process gas | Standard: air, oxygen, argon, nitrogen on request |
Plasma generator | 40KHz |
Interface | PLC+HMI |
CHAMBER | |
Dimensions | Φ140×270(D)mm |
Volume | 5L |
PRODUCT FEATURES
Fast Deposition Rate
Good Film Quality
Process Stability
High Productivity
Fully Automatic
Simple Operation
Plasma
Copyright@ NAEN Technology Co., Ltd. All Rights Reserved.|
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