DESCRIPTION
Tabletop Plasma Cleaner is a compact, inexpensive tabletop plasma equipment with aredesigned hinged door and viewing window, active fan cooling and improved meteringvalve, suitable for nanoscale surface cleaning and activation of small samples.
NE-PE05F as a tabletop plasma cleaner which is a compact RF-powered plasma system that provides precise, low-damage treatment for sensitive surfaces such as semiconductors, MEMS, and thin films. This RF energy creates a conforming gas plasma that comes in contact with the material surfaces inside the vacuum chamber. Two or more steps can be conducted successively, such as surface cleaning and surface coating, or cleaning, etching, and activating due to advances in plasma system control software.
The principle is to use high-frequency alternating electric fields to act on vacuum gas to form a large amount of plasma, and remove pollutants on the surface of materials through complex physical and chemical processes. This method can improve the adhesion and wettability of materials, remove different types of pollutants and impurities, and lay a good foundation for subsequent processes.
Plasma cleaning organics
Plasma surface activation to improve adhesion
PDMS & microfluidic devices
PEEK & other engineering polymers
PTFE
Metals
Ceramics
Glass & optical devices
PARAMETER
Dimensions | Geometry | 550 (L) × 460 (W) x 520 (H) MM |
Plasma generator | Power | 0–200W (adjustable) |
Frequeny | 13.56 MHz (optional:40Khz) | |
Chamber | Material | 316 stainless steel |
Form | Cylindrical | |
Volume | 4.3 L | |
Dimensions | 143(D)× 270(W)MM | |
Processing area | 134(W) × 248 (D) MM | |
Process Control | Discharge mode | CCP |
Interface | 4.3'' touch screen + PLC | |
Gas channels | 2 channels, support O₂, Ar, N₂, and H₂, etc | |
Flow value | 0-500 SCCM | |
Service | Electrical | AC220, 50–60Hz |
Power cord | Suited to region |
PRODUCT FEATURES
Fast Deposition Rate
Good Film Quality
Process Stability
High Productivity
Fully Automatic
Simple Operation
Plasma
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