NE-PE05F Tabletop Plasma Cleaner
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DESCRIPTION

High-Precision RF Plasma Cleaner for Research Applications


Our Tabletop Plasma Cleaner is a compact, inexpensive tabletop plasma equipment with aredesigned hinged door and viewing window, active fan cooling and improved meteringvalve, suitable for nanoscale surface cleaning and activation of small samples.


NE-PE05F as a tabletop plasma cleaner which is a compact RF-powered plasma system that provides precise, low-damage treatment for sensitive surfaces such as semiconductors, MEMS, and thin films. This RF energy creates a conforming gas plasma that comes in contact with the material surfaces inside the vacuum chamber. Two or more steps can be conducted successively, such as surface cleaning and surface coating, or cleaning, etching, and activating due to advances in plasma system control software.


NE-PE05F's principle is to use high-frequency alternating electric fields to act on vacuum gas to form a large amount of plasma, and remove pollutants on the surface of materials through complex physical and chemical processes. This method can improve the adhesion and wettability of materials, remove different types of pollutants and impurities, and lay a good foundation for subsequent processes.


NE-PE05F is widely used in scientific research institutions, enterprise R&D units and small batch production proofing,including:


  • Plasma cleaning organics

  • Plasma surface activation to improve adhesion

  • PDMS & microfluidic devices

  • PEEK & other engineering polymers

  • PTFE

  • Metals

  • Ceramics

  • Glass & optical devices

PARAMETER

DimensionsDimensions460mm (W) x 520mm (H) x 550mm (L)
Weight80KG (Including vacuum pump)
Plasma generatorPower0–200W, continuously variable output
Frequeny13.56 MHz
ChamberMaterialStainless Steel
FormCylindrical
Volume5L
Dimensions140(Ф)×270(D)mm

Discharge Electrode

1 aluminum alloy special electrode + 1 tray

Process Control

Discharge Mode

CCP
Interface4.3” with recipe store+PLC
Gas Channel OptionsFloat Flowmeter/x2 MFC (customizable)
Flow Value0-500ml
ServiceElectricalAC220, 50–60Hz
Power CordSuited to region


PRODUCT FEATURES

01

Fast Deposition Rate

Fast Deposition Rate

02

Good Film Quality

Good Film Quality

03

Process Stability

Process Stability

04

High Productivity

High Productivity

05

Fully Automatic

Fully Automatic

06

Simple Operation

Simple Operation

RELATED PRODUCTS

Contact
  • +86 173 0440 3275
  • sales@naentech.cn
  • Huaming City, Guangming District, Shenzhen, Guangdong, China
Custom Plasma Equipment

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