Plasma cleaning equipment is to ionize the gas into a plasma state by applying sufficient energy to the gas, and use the properties of these active components to treat the surface of the sample, so as to achieve the purpose of cleaning, modification, and photoresist ashing. 

NE-PE10F is a RF desktop plasma equipment system which is used in a wide range of fields, from the manufacture of semiconductors and electronic components to medical applications. Plasma treatment cleans materials by decomposing and vaporizing microscopic organic matter adhering to the material surface. It also has the effect of surface modification by breaking molecular bonds on the material surface and changing the surface composition. In addition, the plasma decorates the surface of the material with hydroxyl groups, making it hydrophilic and less likely to repel liquids.

The surface modification of the material by plasma changes the microstructure of the material surface and the chemical composition of the material surface, including the surface chemical composition, wettability, surface microstructure, etc., to achieve the purpose of surface modification of the material. The surface chemical composition of the material modified by low temperature plasma changes, and new chemical elements and chemical active functional groups are introduced on the surface of the material. The wettability of the material surface changes, and the hydrophilicity or hydrophobicity increases. The surface morphology of the material changes, and the surface roughness of the material usually increases.

NE-PE10F is widely used in scientific research institutions, enterprise R&D units and small batch production proofing,including:

• Plasma cleaning organics

• Plasma surface activation to improve adhesion

• PDMS & microfluidic devices

• PEEK & other engineering polymers

• PTFE

• Metals

• Ceramics

• Glass & optical devices