NE-PE10F small plasma cleaning equipment consists of a vacuum system, a vacuum chamber, a gas circulation system, a power control system and a microcomputer control unit. NE-PE10F has a multi-layer processing electrode, which effectively improves the utilization rate of the chamber and meets various cleaning needs. 

The NE-PE10F is a benchtop low pressure radio frequency Plasma Treater which designed for R&D laboratories. It offers very fast treatment times and optimum adhesion properties for downstream coating, gluing, painting, and printing applications.

Features

· Primary plasma immersion for uniform treatment of complex parts

· PLC control with touchscreen display for tight process control

· Process recipe storage under password protection

· 13.56 MHz generator and automatic match network

· Two independent gas channels

· Desktop design, compact size

Vacuum Plasma Technology

Vacuum plasma treatment systems are designed to offer a fast and efficient method for improving the adhesion and wettability properties of different materials. 

Safety features and monitoring capabilities are built into the system, ensuring that the process is both safe and effective. Vacuum plasma technology provides a uniform treatment on three-dimensional parts without the need for rotation or adjustment during the process. This results in reduced cycle times and increased productivity.

Benefits 

It provides the users the ability to adjust various parameters, such as time, pressure, and power, to achieve the desired results. As the technology doesn’t require any special treating gases, it can function with clean, dry air or a combination of oxygen and argon for specific chemical changes.