DESCRIPTION

NE-PE13F is a micro plasma cleaning machine. It is microprocessor controlled benchtop plasma treatment systems which are ideally suited to surface activation, cleaning and modification of a wide range of materials including polymers, metals, glass and ceramics.

NE-PE13F has a range of gas inlet options to suit budget and application; fixed, single MFC, dual MFC and vapour delivery. With precision flow control and integrated pressure gauge, the NE-PE13F delivers unmatched reliability & repeatability by removing common errors in gas flow and gas type settings which will be familiar to users of equivalent equipment that utilise manual needle valves.

Address specific material treatments including:

Plasma cleaning
Plasma surface activation to improve adhesion
Functional plasma coatings
Plasma etching
PDMS & microfluidic devices
PEEK & other engineering polymers
PTFE
Metals
Ceramics
Glass & optical devices

Micro Plasma Cleaning Machine NE-PE13F

The NE-PE13F Micro Plasma Cleaning Machine is a benchtop plasma system engineered for cleaning small components and delicate surfaces in precision industries. It delivers controlled plasma energy for removing micro-level contaminants and preparing surfaces for improved adhesion.

Applications

PCB and IC packaging surface cleaning
MEMS and microfluidics device treatment
Watch and optical instrument cleaning
Lab-scale R&D surface preparation

Advantages

Compact design for lab or desktop use
Easy operation with digital touchscreen control
Supports air, oxygen, and argon plasma
Precise cleaning without chemical exposure

Working Process

Place the sample on the removable tray
Chamber is pumped to low vacuum (≤100 Pa)
Process gas is introduced and plasma is generated
Surface contaminants are removed through plasma reactions
System vents and sample is ready for downstream use

Technical Specifications

Chamber size: 130 × 130 × 130 mm
RF Power: 0–100 W
Supported gases: Air, O₂, Ar
Vacuum level: ≤100 Pa
Sample tray: 110 × 110 mm

PRODUCT FEATURES

Fast Deposition Rate

Good Film Quality

Process Stability

High Productivity

Fully Automatic

Simple Operation

Enclosure	Dimensions	600mm(L)×550mm(W) ×580 mm(H)
Enclosure	Weight	80KG (Including vacuum pump)
Plasma Generator	Power	0–300W, continuously variable output
Plasma Generator	Frequeny	13.56 MHz
Chamber	Material	Stainless Steel
	Form	Cylindrical
	Volume	13.5L
	Dimensions	240（L）×280（D）x 200mm (H)mm
Process Control	Discharge Modes	CCP & RIE
	Interface	4.3” with recipe store+PLC
	Gas Channel Options	Float Flowmeter/x2 MFC (customizable)
	Flow Value	0-500ml
Services	Electrical	AC220, 50–60Hz
Services	Power Cord	Suited to region