DESCRIPTION
The Desktop Plasma Cleaner NE-PE25H represents a high-performance low-temperature plasma system, integrating a Mass Flow Controller (MFC) for accurate process gas regulation and a Pirani precision resistance vacuum gauge capable of 0.1% measurement accuracy. This configuration ensures reliable operation in demanding laboratory and industrial environments.
Widely applied in material processing, low-temperature plasma systems utilize energetic particles to induce physical and chemical interactions with material surfaces. These processes—including activation, cleaning, etching, and doping—significantly improve key surface characteristics such as surface energy, hydrophilicity, and adhesion.
Eco-Efficient Processing: Eliminates drying stages, liquid waste, and exhaust treatment associated with wet methods, reducing energy use while ensuring operator safety and environmental compatibility.
Universal Adaptability: Ensures uniform treatment even on complex surface geometries.
Rapid & User-Friendly Operation: Provides visible results within seconds to minutes through straightforward procedures.
Surface-Selective Modification: Modifications are limited to surface depths ranging from angstroms to micrometers, preserving bulk material properties while enhancing surface functionality.
PARAMETER
| ENCLOSURE | Dimensions | 650 × 649 × 666 mm(L × W × H) |
PLASMA POWER SUPPLY | Power | 0-1000W, continuously variable output |
| Frequency | 40 kHz (optional: 13.56MHz) | |
CHAMBER | Material | Stainless Steel |
| Dimensions | 380 × 390 × 170 mm (L × D × H), 25L | |
| Effective Processing Area | 332(W)×320(D)×30(H)mm | |
| Shelves | 2 | |
PROCESS CONTROL | Interface | PLC with 7'' Touch Screen HMI |
| Gas Channels | x2 MFC, compatible with O₂, Ar, N₂, H₂, etc. | |
| Pressure Gauge | Pirani Sensor | |
SERVICES | Electrical | 210-250 VAC, 50-60Hz |
| Power Cord | Suited to region | |
| Compliance | CE |
PRODUCT FEATURES
Fast Deposition Rate
Good Film Quality
Process Stability
High Productivity
Fully Automatic
Simple Operation
Plasma
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