The NE-Q15H inductively coupled plasma cleaning machine mainly consists of a gas path system, a pump system, and a plasma cleaning system. The gas system mainly consists of gas cylinders, mass flow controllers (MFCs), gas mixing chambers, related valves, and pipelines. The main function is to provide a stable proportion of process gas. The core component of the pump system is the mechanical pump, which can provide background vacuum for the cleaning chamber. The plasma cleaning system is the core device of the equipment, mainly composed of a radio frequency power source and an inductively coupled plasma source (ICP). The radio frequency power source can provide an alternating voltage of 13.56MHz to the radio frequency coil, thereby generating a radio frequency field to ionize the mixed gas in the quartz cavity and form plasma.

Inductively Coupled Plasma (ICP) plasma cleaning machine has the characteristics of low temperature, high electron density, and no electrode pollution. In addition to cleaning function, plasma cleaning machine plays an irreplaceable role in changing the physical and chemical properties of material surface, which can significantly improve the surface energy and adhesion of materials. In addition, through plasma treatment, the chemical bonds on the material surface can be broken and new functional groups can be introduced, thereby changing the surface wettability.