DESCRIPTION
The heating type desktop plasma cleaner NE-Y18A is mainly composed of a high vacuum reaction chamber, a heating system, a temperature control system, a vacuum pumping system, a vacuum measurement system, a pressure control system, a power supply system, a process gas system, an electrical control system, and control software. On the basis of traditional vacuum plasma cleaning machines, the chamber heating function has been added, which enables the material to maintain a set temperature (such as 40 ℃~200 ℃, and some customized equipment can have higher temperatures) during the plasma treatment process.
For many high-end manufacturing processes, the synergistic effect of heating and plasma can promote chemical reactions, increase reaction rates, significantly improve cleaning efficiency, and shorten process time.
Enhanced process flexibility and material adaptability: The introduction of heating modules endows the plasma cleaning system with stronger process control capabilities, enabling it to adapt to a wider range of substrates and more stringent industrial requirements, and improving the modification effect of difficult to handle materials.
PARAMETER
| ENCLOSURE | Dimensions | 640mm(W)×665mm(D) ×580 mm(H) |
PLASMA POWER SUPPLY | Power | 0-300W, continuously variable output |
| Frequency | 13.56MHz | |
CHAMBER | Material | 316 Stainless steel |
| Dimensions | 300(W)×300(D)×200(H)mm; 18L | |
| Effective Processing Area | 200(W)×200(D) | |
| Heating Temperature | 200℃(customizable) | |
PROCESS CONTROL | Interface | PLC with 7'' touch screen HMI |
| Gas Channels | x2 MFC, compatible with O₂, Ar, N₂, H₂, etc. | |
| Pressure Gauge | Pirani sensor | |
SERVICES | Electrical | 210-250 VAC, 50-60Hz |
| Power Cord | Suited to region | |
| Compliance | CE |
PRODUCT FEATURES
Fast Deposition Rate
Good Film Quality
Process Stability
High Productivity
Fully Automatic
Simple Operation
Plasma
Copyright@ NAEN Technology Co., Ltd. All Rights Reserved.|
Sitemap
| Powered by