Benchtop R&D laboratories Small Low Pressure Plasma System NE-PE05F
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DESCRIPTION

The NE-PE05F is a benchtop low pressure radio frequency Plasma Treater which designed for R&D laboratories. It offers very fast treatment times and optimum adhesion properties for downstream coating, gluing, painting, and printing applications.


The systems surface treatment process is primarily used for the processing of electronics and medical devices. The PLC control ensures a critical process control and monitoring. Together with a process recipe storage this makes it a versatile tool for the R&D laboratories.


In the vacuum treating chamber, a vacuum is built up to between 2 and 12 mbar before an electrical discharge is created through the integrated plasma electrode. Treatment cycle times are often short, between 2-120 seconds depending on the material and its formulation.The NE-PE05 appreciated for its simplicity of operation, reliability in production, and fast process speed.


Features

· Primary plasma immersion for uniform treatment of complex parts

· PLC control with touchscreen display for tight process control

· Process recipe storage under password protection

· 1000 watt, 13.56 MHz generator and automatic match network

· Two independent gas channels

· Desktop design, compact size


Vacuum Plasma Technology

Vacuum plasma treatment systems are designed to offer a fast and efficient method for improving the adhesion and wettability properties of different materials. 

Safety features and monitoring capabilities are built into the system, ensuring that the process is both safe and effective. Vacuum plasma technology provides a uniform treatment on three-dimensional parts without the need for rotation or adjustment during the process. This results in reduced cycle times and increased productivity.


Benefits 

It provides the users the ability to adjust various parameters, such as time, pressure, and power, to achieve the desired results. As the technology doesn’t require any special treating gases, it can function with clean, dry air or a combination of oxygen and argon for specific chemical changes.



PARAMETER

Technical Specifications
NE-PE05F Low Pressure Plasma Treatment Systems
ENCLOSURE
Dimensions550mm(L)×460mm(W) ×520 mm(H)
PLASMA POWER SUPPLY 
Mains voltage and frequency220 VAC 50/60 Hz
Output voltage/plasma power0-200W (adjustable)
PROCESS CONTROL
Process gasStandard: air, oxygen, argon, nitrogen on request
Plasma generator
13.56MHz
Interface4.3’’ PLC+HMI
CHAMBER
DimensionsΦ140×270(D)mm
FormCylindrical
Volume5L


PRODUCT FEATURES

01

Fast Deposition Rate

Fast Deposition Rate

02

Good Film Quality

Good Film Quality

03

Process Stability

Process Stability

04

High Productivity

High Productivity

05

Fully Automatic

Fully Automatic

06

Simple Operation

Simple Operation

INDUSTRY APPLICATION

RELATED PRODUCTS

Contact
  • +86 173 0440 3275
  • sales@naentech.cn
  • Huaming City, Guangming District, Shenzhen, Guangdong, China
Custom Plasma Equipment

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