DESCRIPTION
The NE-PE10 is a desktop plasma cleaning machine widely used in scientific research laboratories and small-batch industrial production. This equipment performs plasma cleaning on material surfaces, inducing modifications such as cleaning, etching, activation, and cross-linking. It generates high-energy polar groups on the material surface and facilitates the formation of new functional groups through introduced free radicals. Consequently, it significantly enhances the material's wettability and adhesion, increases surface energy, improves bonding strength, and elevates product quality and performance.
Compact & Portable: Its small desktop form factor ensures easy placement, mobility, and adaptability for dynamic laboratory and research settings.
Simplified Operation: An integrated control system with an intuitive interface (button or touchscreen) facilitates easy configuration of treatment parameters, process monitoring, and power adjustment, minimizing the need for operator training.
High-Efficacy Plasma Processing: Through plasma generation, the system enables precise surface cleaning, activation, etching, and modification. Key benefits include thorough contaminant removal, significantly enhanced adhesion for bonding and coatings, improved wetting characteristics, and overall superior surface properties.
Multi-Material Processing Capability: The system supports plasma cleaning for a wide array of substrates (e.g., metals, plastics, ceramics, glass), proving essential in both R&D and manufacturing applications for enhancing surface properties.
Plasma cleaning organics
Plasma surface activation to improve adhesion
PDMS & microfluidic devices
PEEK & other engineering polymers
PTFE
Metals
Ceramics
Glass & optical devices
PARAMETER
Enclosure | Geometry | 600 (L) × 530 (W) × 550 (H) MM |
Weight | ≈45 KG | |
Plasma Generator | Power | 0–300W (adjustable) |
Frequeny | 40 kHz | |
Chamber | Material | Stainless steel |
Form | Cylindrical | |
Volume | 10.8 L | |
Dimensions | 200 (L) × 270(D) × 200(H) MM | |
Processing area | 192 (W) × 210 (D) MM | |
Process Control | Interface | 4.3'' touch screen + PLC |
Gas channels | 2 channels, support O₂, Ar, N₂, and H₂, etc | |
Electrode gap | 35.6 MM (adjustable) | |
Number of processing layers | 2 layers | |
Services | Electrical | AC220, 50–60Hz |
Power cord | Suited to region |
PRODUCT FEATURES
Fast Deposition Rate
Good Film Quality
Process Stability
High Productivity
Fully Automatic
Simple Operation
Plasma
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