NE-PE10 (LF) Desktop Plasma Cleaning Machine
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DESCRIPTION

The NE-PE10 is a desktop plasma cleaning machine widely used in scientific research laboratories and small-batch industrial production. This equipment performs plasma cleaning on material surfaces, inducing modifications such as cleaning, etching, activation, and cross-linking. It generates high-energy polar groups on the material surface and facilitates the formation of new functional groups through introduced free radicals. Consequently, it significantly enhances the material's wettability and adhesion, increases surface energy, improves bonding strength, and elevates product quality and performance.

Product Features:

  1. Compact & Portable: Its small desktop form factor ensures easy placement, mobility, and adaptability for dynamic laboratory and research settings.

  2. Simplified Operation: An integrated control system with an intuitive interface (button or touchscreen) facilitates easy configuration of treatment parameters, process monitoring, and power adjustment, minimizing the need for operator training.

  3. High-Efficacy Plasma Processing: Through plasma generation, the system enables precise surface cleaning, activation, etching, and modification. Key benefits include thorough contaminant removal, significantly enhanced adhesion for bonding and coatings, improved wetting characteristics, and overall superior surface properties.

  4. Multi-Material Processing Capability: The system supports plasma cleaning for a wide array of substrates (e.g., metals, plastics, ceramics, glass), proving essential in both R&D and manufacturing applications for enhancing surface properties.

Desktop Plasma Cleaning Machine of NE-PE10 is widely used in scientific research institutions, enterprise R&D units and small batch production proofing, including:

  • Plasma cleaning organics

  • Plasma surface activation to improve adhesion

  • PDMS & microfluidic devices

  • PEEK & other engineering polymers

  • PTFE

  • Metals

  • Ceramics

  • Glass & optical devices

PARAMETER

EnclosureGeometry
600 (L) × 530 (W) × 550 (H) MM
Weight
≈45 KG
Plasma GeneratorPower0–300W (adjustable)
Frequeny40 kHz
ChamberMaterialStainless steel
FormCylindrical
Volume10.8 L
Dimensions

200 (L) × 270(D) × 200(H) MM

Processing area192 (W) × 210 (D) MM
Process ControlInterface4.3'' touch screen + PLC
Gas channels2 channels, support O₂, Ar, N₂, and H₂, etc
Electrode gap35.6 MM (adjustable)
Number of processing layers2 layers
Services

Electrical

AC220, 50–60Hz
Power cordSuited to region


PRODUCT FEATURES

01

Fast Deposition Rate

Fast Deposition Rate

02

Good Film Quality

Good Film Quality

03

Process Stability

Process Stability

04

High Productivity

High Productivity

05

Fully Automatic

Fully Automatic

06

Simple Operation

Simple Operation

INDUSTRY APPLICATION

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