ICP Plasma CleanerNE-Q05 adopts the ICP inductively coupled external electrode plasma generation method, which is characterized by a simple structure, high plasma density, and no electrodes inside the chamber, effectively avoiding electrode sputtering pollution. The vacuum chamber adopts a high-purity quartz glass chamber, which is easy to clean and not easy to react with the product.

Plasma cleaning machines can enhance the adhesion, compatibility, and wettability of samples, as well as disinfect and sterilize them. At present, plasma cleaning technology is widely used in fields such as optics, optoelectronics, electronics, materials science, life sciences, polymers, biomedicine, microfluidics, etc.