The NE-Q05 Desktop Plasma Cleaner utilizes an inductively coupled plasma (ICP) source with an external electrode configuration, delivering high-density plasma within a structurally optimized system. By maintaining all electrodes outside the processing chamber, the design entirely eliminates contamination risks from electrode sputtering. The high-purity quartz glass vacuum chamber ensures chemical inertness, ease of maintenance, and compatibility with sensitive materials.

This system significantly improves critical surface properties such as adhesion strength, biocompatibility, and wettability, while also enabling effective disinfection and sterilization. Plasma cleaning technology is now extensively applied across disciplines including optics, optoelectronics, electronics, materials science, life sciences, polymer engineering, biomedicine, and microfluidics.