The NE-Q05H is a compact quartz-chamber plasma system designed for precision cleaning and surface activation of diverse materials—including polymers, metals, glass, and ceramics—significantly improving adhesion performance even on challenging surfaces.

Utilizing an Inductively Coupled Plasma (ICP) source, the system delivers high plasma density and dissociation rates. With all electrodes positioned outside the vacuum chamber, it eliminates internal electrode sputtering and contamination risks.

The chamber is constructed entirely of quartz glass, chosen for its excellent temperature resistance, ease of cleaning, mechanical strength, and full RF power transmission capability—making it an ideal material for high-purity processing environments.