RF Plasma Cleaning Machine is mainly composed of vacuum chamber, high-frequency plasma power supply, vacuum generation and measurement system, process gas system, control system and other parts. 

The basic working principle is to use a vacuum pump to evacuate the working room to a certain vacuum degree, and then introduce process gas. Under the action of the high-frequency generator, a high-frequency alternating electric field is formed between the anode and the cathode to ionize the gas and form plasma. When the gas reaches the plasma state, the gaseous molecules will split into many highly active particles. 

The mechanism of  RF Plasma Cleaning Machine relies on the "activation" of substances in the "plasma state" to achieve the purpose of removing stains on the surface of objects or improving surface activity. It can be used to improve the adhesion, hydrophilicity, printing and other properties of products, and can also be used to remove organic matter, oil stains, oxide layers and other pollutants on the surface of materials.

NE-PE80F is a large-scale industrial low pressure plasma treatment system, equipped with high power, large cavity, high density, high stability, for large-scale continuous production. 

NE-PE80F is widely used in scientific research institutions, enterprise R&D units and small batch production, including:

• Plasma cleaning organics

• Plasma surface activation to improve adhesion

• Form new functional groups and improve hydrophilicity

• Wafer Cleaning, remove the photoresist

• ITO & FTO & Glass & Pottery &Metal 

• PP & PET & PVC & PEEK & PC