NE-PE40F Vertical Plasma Cleaning Machine
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DESCRIPTION

Vertical Plasma Cleaning Machine is a industrial low pressure plasma treatment system, equipped with high power, large cavity, high density, high stability, for large-scale continuous production. 


Vertical Plasma Cleaning Machine is used in a wide range of fields, from the manufacture of semiconductors and electronic components to medical applications. Plasma treatment cleans materials by decomposing and vaporizing microscopic organic matter adhering to the material surface. It also has the effect of surface modification by breaking molecular bonds on the material surface and changing the surface composition. In addition, the plasma decorates the surface of the material with hydroxyl groups, making it hydrophilic and less likely to repel liquids.


Advantages: 


  • The plasma cleaning machine has high cleaning efficiency and a wide range of applications; 

  • There are no requirements for the appearance, size, material, etc. of the cleaning sample; 

  • During the cleaning process, the temperature rise is relatively small and can basically reach room temperature; 

  • The RF power can be continuously adjusted, and the efficient special electrode is the guarantee for the generation of uniform plasma; 

  • The unique overload, overheating and short-circuit protection circuit can ensure the stability and safety of the RF power supply; 

  • The equipment adopts a modular design, and installation and maintenance are extremely simple.


NE-PE40F is widely used in scientific research institutions, enterprise R&D units and small batch production, including:


  • Plasma cleaning organics

  • Plasma surface activation to improve adhesion

  • Form new functional groups and improve hydrophilicity

  • Wafer Cleaning, remove the photoresist

  • ITO & FTO & Glass & Pottery &Metal 

  • PP & PET & PVC & PEEK & PC

PARAMETER

EnclosureDimensions685mm(L) X 830m (w) X 1450mm (H)
Weight

300KG(Including vacuum pump)

Plasma GeneratorFrequency

13.56Mhz

Power

50-500w(Adjustable)

ChamberMaterial

Aviation-grade aluminum alloy

Dimensions

350(L)×405(D)×300(H)mm

Volume42L
Process Layers4

Discharge Modes

CCP & RIE 

Process Control

Gas Flow Controller

MFC

Flow Value

0-500 SCC

Gas Channel

2
Vacuum Gauge

Pirani

Interface7’’with recipe store+PLC
ServicesElectricalAC220, 50–60Hz
Power CordSuited to region


PRODUCT FEATURES

01

Fast Deposition Rate

Fast Deposition Rate

02

Good Film Quality

Good Film Quality

03

Process Stability

Process Stability

04

High Productivity

High Productivity

05

Fully Automatic

Fully Automatic

06

Simple Operation

Simple Operation

RELATED PRODUCTS

Contact
  • +86 173 0440 3275
  • sales@naentech.cn
  • Huaming City, Guangming District, Shenzhen, Guangdong, China
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