Semiconductor Four-Lane Inline Plasma System
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DESCRIPTION

Four-Lane Inline Plasma System has been designed to sustain all the demands of a 24/7 continuous inline production environment where large-scale production volumes are top priority. Four-Lane Inline Plasma System's main advantage is its two independent plasma chambers. Each plasma chamber can accommodate the loading and unloading of two carriers at the same time in one movement; the total four carriers in the machine are then processed in parallel guaranteeing a high throughput production.


Four-Lane Inline Plasma System conveyors systems can be configured to accept one or two carriers from the upstream conveyor at once as well as providing one or two carriers to the downstream system at once.


Advanced traceability options are available on this system to easily integrate with a variety of Manufacturing Execution Systems (MES).


  • In manufacturing, QML-4CI is typically used for:

  • Plasma cleaning before wire-bonding on modules

  • Plasma cleaning before transfer molding on modules

  • Plasma cleaning on PCBs, BGA substrates


Four-Lane Inline Plasma System has been used in a range of applications within the Semiconductors and Automotive industries.

This device realizes automatic transmission and cleaning of lead frames, automatically removing the lead frames from the material box and performing plasma cleaning to remove surface contamination, improve surface activity, and then automatically placing them back into the material box without human interference throughout the process. The track width is adjustable and compatible with products of different specifications and sizes. Independent chip cleaning greatly improves cleaning uniformity.


As a precision dry cleaning equipment, four-Lane Inline Plasma System can effectively remove pollutants, improve material surface properties, and has advantages such as high automation, high cleaning efficiency, high equipment cleanliness, and wide adaptability.

PARAMETER

DimensionsL*W*H: 2000mm* 1200mm* 1700mm
Plasma Chamber ConfigurationTwo plasma chambers each containing two carriers
Product SizeCarrier: 120-270mm(L), 40-83mm(W)
Plasma GeneratorDouble 100W RF Generator 13.56 MHz
Automatic tuning system
Mains Voltage and Frequency1PH220V、40A、50 Hz
Gas Lines2 Process gas lines with MFlC


PRODUCT FEATURES

01

Fast Deposition Rate

Fast Deposition Rate

02

Good Film Quality

Good Film Quality

03

Process Stability

Process Stability

04

High Productivity

High Productivity

05

Fully Automatic

Fully Automatic

06

Simple Operation

Simple Operation

INDUSTRY APPLICATION

RELATED PRODUCTS

Contact
  • +86 173 0440 3275
  • sales@naentech.cn
  • Huaming City, Guangming District, Shenzhen, Guangdong, China
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