DESCRIPTION
Microwave plasma cleaning machine is a kind of advanced equipment that uses microwave energy to produce plasma to clean the surface of objects. It can remove organic matter, photoresist, inorganic matter, oxide layer and other pollutants. It can clean the surface of silicon wafer, gold PAD, aluminum PAD and so on. The cleaning machine has the advantages of convenient operation, high efficiency, clean surface, no scratch, and is conducive to ensuring product quality. There is no air pollution in the cleaning process, and no waste liquid and waste residue are produced. It is a real energy saving and cost reduction.
PARAMETER
Enclosure | Dimensions | 1200(W)×1200(D) ×1800(H) mm |
Plasma Generator | Discharge generator | Solid-state power supply |
Frequency | 2.45GHz | |
Power | 1000W(adjustable) | |
Chamber | Material | AL6061, military-grade seal |
Carrier stage size | Φ270mm | |
Volume | 100L | |
Dimensions | 480(W)*505(D)*410(H)mm | |
Handling ability | Maximum of 6 wafers ( 8 / 10 inch silicon wafers ) | |
Process Control | Gas flow controller | MFC / gas path |
Flow Value | 500SCCM | |
Number of gas paths | 2 process gas path, can support oxygen, argon, nitrogen, hydrogen, argon hydrogen mixed gas, etc. | |
Pressure gauge | Pirani | |
Vacuum pump | Dry pump, 80m³/h | |
Interface | 12” with recipe store+PLC+industrial computer | |
Services | Electrical | AC380V, 50/60Hz |
Power Cord | Suited to region |
RELATED PRODUCTS
Plasma
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