chenyan@naentech.cn

News
Home / News
Plasma cleaning of gold-plated substrates for power semiconductor chips improves the bonding strength of subsequent nanosilver sintering
Plasma cleaning of gold-plated substrates for power semiconductor chips improves the bonding strength of subsequent nanosilver sintering Plasma cleaning has a significant optimization effect on the bonding strength of Ag Au sintered joints. Sintering the gold-plated substrate after plasma cleaning with semi sintered silver paste is beneficial for the interaction between sintered silver and substrate in the subsequent sintering process.

Jul. 21, 2026

Principle of ICP Inductively Coupled Plasma Source Discharge
Principle of ICP Inductively Coupled Plasma Source Discharge Inductively coupled plasma source (ICP) is usually excited by a radio frequency coil (i.e. ICP antenna) arranged outside the reaction chamber, and its energy is input through a matching network coupled by a high-frequency oscillator.

Jul. 21, 2026

Plasma modification of MOF materials
Plasma modification of MOF materials Low temperature plasma modified metal organic framework (MOF) materials have been a research hotspot in the field of materials science in recent years. By interacting with high-energy particles in plasma and MOF surfaces, their pore structure, surface chemical properties, and active sites can be precisely controlled.

Jul. 21, 2026

Etching methods in plasma
Etching methods in plasma In plasma etching technology, based on the main mechanism of material removal, its core can be divided into two categories: physical etching and chemical etching. In general, there are four basic plasma etching processes, namely sputtering, pure chemical etching, ion energy driven etching, and ion barrier layer composite etching.

Jul. 10, 2026

Plasma treatment improves the bonding performance of additive silicone rubber
Plasma treatment improves the bonding performance of additive silicone rubber Plasma treatment can improve the adhesion performance of silicone rubber. One reason for this is that the plasma generates active groups on the surface of silicone rubber, causing a change in surface polarity; On the other hand, plasma treatment causes etching and oxidation on the surface of silicone rubber

Jul. 10, 2026

Jet plasma treatment improves the anti printing pollution performance of silicone rubber cables
Jet plasma treatment improves the anti printing pollution performance of silicone rubber cables Silicone rubber cables often suffer from printing pollution, which affects their use. Jet treatment can effectively solve the problem of printing pollution on the surface of silicone rubber, while reducing the water contact angle on the surface of silicone rubber.

Jul. 10, 2026

Previous 1 2 3 4 ... 29 30 Next
Consultation Request a Plasma Treatment Overview
REQUEST

Plasma

Home Product Center Plasma Application

Support

Video News Service About Contact
Contact
  • +86 181 6571 2881
  • chenyan@naentech.cn
  • Huaming City, Guangming District, Shenzhen, Guangdong, China
Custom Plasma Equipment

Copyright@ NAEN Technology Co., Ltd. All Rights Reserved.| Sitemap | Powered by Reanod