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The difference between plasma cleaning and plasma etching
The difference between plasma cleaning and plasma etching Low pressure plasma cleaning is similar to plasma etching process, both of which use active particles generated by plasma to react with the material surface and remove substances from the material surface. The main difference is that one is to remove the unnecessary parts of the material itself.

May. 10, 2025

Comparison of advantages and disadvantages of dry pump and oil pump in vacuum plasma cleaning machine
Comparison of advantages and disadvantages of dry pump and oil pump in vacuum plasma cleaning machine In order to obtain a vacuum environment, a vacuum plasma cleaning machine requires a component that can make the system reach a vacuum environment - a vacuum pump. Vacuum plasma cleaning machines are equipped with dry pumps and oil pumps, each with its own advantages and disadvantages.

May. 10, 2025

Surface modification of nano injection molded polymer by plasma treatment
Surface modification of nano injection molded polymer by plasma treatment Nanoinjection molding is not only a molding process, but also a connecting technology. The core of the technology is the anchoring effect between polymers and metals. How to improve the bonding strength of heterogeneous materials is the main breakthrough direction of nanoinjection molding.

May. 10, 2025

O2/CF4 combined plasma treatment of PTFE high-frequency printed circuit board through holes
O2/CF4 combined plasma treatment of PTFE high-frequency printed circuit board through holes Plasma treatment is an effective method to improve the metallization quality of PTFE high-frequency plate holes. After plasma treatment, the contact angle of PTFE surface decreases, and the content of non-polar functional groups such as C-C/C-H on the surface decreases.

May. 10, 2025

Plasma treatment of porous carbon materials
Plasma treatment of porous carbon materials Plasma treatment, as a technique for surface modification of porous carbon materials, has received increasing attention. During plasma treatment, slow chemical reactions occur on the surface of porous carbon materials, generating some chemically active sites to improve the adsorption performance of carbon materials.

May. 10, 2025

The effect of oxygen argon plasma cleaning on the surface roughness of single crystal silicon
The effect of oxygen argon plasma cleaning on the surface roughness of single crystal silicon From the results of surface roughness and PSD curve, it can be seen that plasma cleaning can achieve the purpose of cleaning and pretreatment on the surface of single crystal silicon, while also having a relatively small impact on the surface roughness of single crystal silicon.

May. 10, 2025

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