The structure of NE-PE110F Vacuum Plasma Cleaning Machine is mainly divided into five parts: control system, excitation power system, vacuum chamber, process gas system and vacuum pump system, and the working RF frequency is 13.56MHz. Plasma is a state of matter. High-speed active groups, ions, electrons, atoms, photons, etc. can be generated by artificially creating an electric field and changing the positive and negative pressures in the space where the electric field exists; these substances generally remain electrically neutral. The vacuum plasma cleaning machine is a device that uses RF power to generate these free-state components in a vacuum chamber to contact and bombard the surface of the object being treated. It can be used for organic film removal, interface activation, fine grinding, and reducing interface damage. It can improve the hydrophilicity and wettability of the material surface, remove surface organic matter, and achieve cleaning and modification.