Low-pressure Plasma Cleaner NE-PE160F
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DESCRIPTION

NE-PE160F Low-pressure Plasma Cleaning Equipment uses plasma to clean the surface of materials to achieve the purpose of cleaning, activation, modification, etching, etc. It can be used for precision cleaning in industries such as semiconductors, microelectronics, pre-COG, LED processes, pre-device packaging, vacuum electronics, connectors and relays, activation of surfaces such as plastics, rubber, metals and ceramics, and life science experiments.

NE-PE160F is mainly composed of three parts: control unit, vacuum chamber and vacuum pump. Through CNC technology, various parameters can be easily adjusted. Because the cleaning process is carried out in the vacuum chamber, there is no need to dry after cleaning. It is simple to operate and environmentally friendly.

PARAMETER

ModelNE-PE160F
Plasma generator frequencyRF 13.56MHz (optional:40Khz)
Ultimate vacuum10Pa
Power
0-1000W (adjustable)
Chamber material316 stainless steel / aluminum alloy (optional)
Chamber size
550 (W) * 600 (D) * 500 (H) MM
Chamber volume165 L
Processing area(W) 508 x (D) 510 MM
Gas channels2 channels, supporting O₂, Ar, N₂ and H₂, etc
Processing layers8 layers (customizable)
Control modePLC + touch screen
Power supplyAC 380V, 50 / 60Hz
Dimensions1170mm(L)×1190mm(W) ×1825 mm(H)


PRODUCT FEATURES

01

Fast Deposition Rate

Fast Deposition Rate

02

Good Film Quality

Good Film Quality

03

Process Stability

Process Stability

04

High Productivity

High Productivity

05

Fully Automatic

Fully Automatic

06

Simple Operation

Simple Operation

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