DESCRIPTION
NE-PE160F Low-pressure Plasma Cleaning Equipment uses plasma to clean the surface of materials to achieve the purpose of cleaning, activation, modification, etching, etc. It can be used for precision cleaning in industries such as semiconductors, microelectronics, pre-COG, LED processes, pre-device packaging, vacuum electronics, connectors and relays, activation of surfaces such as plastics, rubber, metals and ceramics, and life science experiments.
NE-PE160F is mainly composed of three parts: control unit, vacuum chamber and vacuum pump. Through CNC technology, various parameters can be easily adjusted. Because the cleaning process is carried out in the vacuum chamber, there is no need to dry after cleaning. It is simple to operate and environmentally friendly.
PARAMETER
Model | NE-PE160F |
Plasma generator frequency | RF 13.56MHz (optional:40Khz) |
Ultimate vacuum | 10Pa |
Power | 0-1000W (adjustable) |
Chamber material | 316 stainless steel / aluminum alloy (optional) |
Chamber size | 550 (W) * 600 (D) * 500 (H) MM |
Chamber volume | 165 L |
Processing area | (W) 508 x (D) 510 MM |
Gas channels | 2 channels, supporting O₂, Ar, N₂ and H₂, etc |
Processing layers | 8 layers (customizable) |
Control mode | PLC + touch screen |
Power supply | AC 380V, 50 / 60Hz |
Dimensions | 1170mm(L)×1190mm(W) ×1825 mm(H) |
PRODUCT FEATURES
Fast Deposition Rate
Good Film Quality
Process Stability
High Productivity
Fully Automatic
Simple Operation
Plasma
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