DESCRIPTION
The NE-PE80 is a large-scale industrial low-pressure vacuum plasma cleaner designed for high-throughput batch surface treatment in manufacturing environments. Built around an 83-liter stainless steel vacuum chamber with a 400 × 360 mm effective processing area and six-tier shelf loading, it provides uniform plasma treatment across large quantities of components per cycle.
Powered by a 0–1000W solid-state 13.56 MHz RF generator and controlled through a PLC-based 10-inch touchscreen interface, the NE-PE80 supports programmable process recipes, automated cycle execution, and real-time parameter monitoring. It accepts the full range of industrial process gases — oxygen, argon, nitrogen, hydrogen, and mixed gases — through two mass flow controller-regulated inlets.
CE certified and configured for 380 VAC three-phase industrial supply, the NE-PE80 is deployed across semiconductor production, automotive component manufacturing, LED and optoelectronic assembly, medical device fabrication, and electronics bonding preparation lines.
High-Power, High-Density Plasma for Production Throughput
83L Large-Volume Chamber for Batch Processing
Six-Tier Shelf Loading for Flexible Batch Configuration
Fully Automated PLC Recipe System
Dual MFC Gas Channels for Process Flexibility
CE Certified for Industrial Deployment
Desktop plasma cleaners and laboratory systems are designed for R&D throughput — typically handling small sample numbers in 2–5 liter chambers. When surface treatment becomes a production step rather than a research step, the requirements change fundamentally:
Batch capacity — In a production environment, treating components individually or in small batches is a throughput bottleneck. The NE-PE80's 83-liter chamber and six-shelf loading system allow a substantial number of parts to be treated simultaneously in a single process cycle, dramatically reducing handling time and cost-per-part compared to laboratory-scale equipment.
Process power — Industrial production substrates often require higher plasma density and faster treatment times than laboratory applications. The 0–1000W RF power range of the NE-PE80 ensures that even chemically resistant surfaces — PTFE, PEEK, heavily oxidized metals, encapsulant polymers — receive sufficient plasma energy for complete activation or contamination removal within production-cycle time constraints.
Consistency and traceability — Production lines require repeatable, documented surface treatment results. The PLC-controlled automated recipe system of the NE-PE80 ensures every batch runs at precisely defined power, pressure, gas flow, and time settings — with data logging for quality records and process validation.
Industrial-grade reliability — Unlike laboratory instruments, the NE-PE80 is engineered for continuous multi-shift operation, with an industrial electrical supply (380 VAC), heavy-duty vacuum system, and components rated for long service intervals.
Semiconductor and Electronics Assembly Plasma clean lead frames, ceramic substrates, PCBs, BGA packages, and die attach surfaces immediately before wire bonding, die attach, flip-chip assembly, or underfill encapsulation.
Automotive Component Manufacturing Activate plastic trim parts, bumper components, sensor housings, gaskets, O-rings, and silicone seals before painting, adhesive bonding, or overmolding.
LED and Optoelectronic Packaging Clean LED chip substrates, reflector cups, lens components, and PCB surfaces before encapsulant dispensing and curing.
Medical Device and Biomedical Manufacturing Activate polymer surfaces of medical implants, diagnostic cartridges, microfluidic chips, catheter tubing, and device housings for improved adhesive bonding, coating adhesion, or hydrophilic modification.
Photovoltaic and New Energy Clean and activate solar cell surfaces, battery electrode substrates, fuel cell components, and energy storage device housings before coating, bonding, or encapsulation.
Packaging and PrintingSurface-activate polymer packaging films, labels, and container surfaces before printing, ink adhesion, or lamination.
For production-scale plasma treatment requirements, batch size assessment, or application-specific process parameter development, contact the NAEN Technology industrial applications team. Sample testing services are available prior to equipment selection.
PARAMETER
| ENCLOSURE | Dimensions | 1100 × 1145 × 1760 mm(L × W × H) |
PLASMA POWER SUPPLY | Power | 0-1000W, continuously variable output |
| Frequency | 13.56MHz (optional: 40 kHz) | |
CHAMBER | Material | Stainless Steel (optional: Aluminum Alloy) |
| Dimensions | 450 × 490 × 380 mm (L × D × H), 83L | |
| Effective Processing Area | 400 × 360 mm (W × D) | |
| Shelves | 6 | |
PROCESS CONTROL | Interface | PLC with 10'' Touch Screen HMI |
| Gas Channels | x2 MFC, compatible with O₂, Ar, N₂, H₂, etc. | |
| Pressure Gauge | Pirani Sensor | |
SERVICES | Electrical | 380 VAC, 50-60Hz |
| Power Cord | Suited to region | |
| Compliance | CE |
PRODUCT FEATURES
Fast Deposition Rate
Good Film Quality
Process Stability
High Productivity
Fully Automatic
Simple Operation
Plasma
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