luwanjun@naentech.cn chenyan@naentech.cn

F&Q
Home / News / F&Q
Principle of plasma etching
Principle of plasma etching The basic principle of plasma etching is to use gas discharge to generate ions or active groups, which combine with atoms on the surface of the etched material to generate volatile substances. These substances are then extracted in a low-pressure vacuum chamber to complete the etching of the material.

Sep. 01, 2025

The difference between plasma cleaning and plasma etching
The difference between plasma cleaning and plasma etching Low pressure plasma cleaning is similar to plasma etching process, both of which use active particles generated by plasma to react with the material surface and remove substances from the material surface. The main difference is that one is to remove the unnecessary parts of the material itself.

May. 10, 2025

Comparison of advantages and disadvantages of dry pump and oil pump in vacuum plasma cleaning machine
Comparison of advantages and disadvantages of dry pump and oil pump in vacuum plasma cleaning machine In order to obtain a vacuum environment, a vacuum plasma cleaning machine requires a component that can make the system reach a vacuum environment - a vacuum pump. Vacuum plasma cleaning machines are equipped with dry pumps and oil pumps, each with its own advantages and disadvantages.

May. 10, 2025

Advantages of plasma cleaning
Advantages of plasma cleaning As a new type of dry cleaning, plasma cleaning has been more and more widely used. It not only reduces the production cost of enterprises, improves the production efficiency, but also effectively uses green resources and is beneficial to environmental ecological construction.

Jul. 13, 2023

Common gas used in plasma cleaning machine and its function
Common gas used in plasma cleaning machine and its function The mechanism of plasma cleaning is mainly the physical and chemical effects of active particles. Therefore, when cleaning different materials, selecting the correct medium gas can achieve twice the result with half the effort.

Jun. 26, 2023

Plasma cleaning principle
Plasma cleaning principle The principle of plasma cleaning is that low-pressure gas is ionized by collision with high-energy electrons to form a highly active plasma, which bombards the surface of the object, removes pollutants in physical and chemical ways, and improves its surface activity.

Jun. 15, 2023

Consultation Request a Plasma Treatment Overview
REQUEST

Plasma

Home Product Center Plasma Application

Support

Video News Service About Contact
Contact
Custom Plasma Equipment

Copyright@ NAEN Technology Co., Ltd. All Rights Reserved.| Sitemap | Powered by Reanod