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Carbon tetrafluoride plasma CF4 gas is a common fluorine-containing gas. Under the action of a high-frequency electric field, glow discharge generates plasma. After carbon tetrafluoride is ionized by electron impact, there are still unionized free radicals with high activity in the READ MORE
hydrogen plasma Hydrogen plasma has certain special properties due to its special reducing properties, and can etch and reduce the surface of materials. READ MORE
Inductively Coupled Plasmas ( ICP ) The discharge in which the RF power is loaded into the non-resonant induction coil and the energy is transmitted to the plasma through inductive coupling is called inductively coupled plasmas ( ICP ). READ MORE
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