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Magnesium alloy plasma surface activation treatment enhances hydrophilicity and improves subsequent coating adhesion
Magnesium alloy plasma surface activation treatment enhances hydrophilicity and improves subsequent coating adhesion After plasma activation, the wettability of magnesium alloy surface is improved, resulting in an increase in the number of hydrophilic functional groups. At the same time, changes in surface microstructure can promote the spreading of coating solution.

Dec. 11, 2025

Plasma modification treatment improves the adhesion performance between aluminum foil and glass fiber
Plasma modification treatment improves the adhesion performance between aluminum foil and glass fiber Plasma is a commonly used material surface modification technique that improves material roughness and increases contact area through etching. After plasma treatment, the bonding between aluminum foil and adhesive becomes denser, and the bonding between aluminum foil resin glass fiber fabric becomes tighter.

Dec. 11, 2025

Principle of Improving Adhesive Properties through Low Temperature Plasma Treatment of Rubber
Principle of Improving Adhesive Properties through Low Temperature Plasma Treatment of Rubber Low temperature plasma surface treatment can significantly improve the wettability and surface properties of rubber surfaces. At the same time, rubber materials undergo various physical and chemical reactions such as etching, cross-linking, and polymerization, which work together to promote better adhesion performance of the treated rubber material

Dec. 05, 2025

Glass plasma cleaning improves hydrophilic wettability and adhesive performance
Glass plasma cleaning improves hydrophilic wettability and adhesive performance The quality of the bonding interface depends on the wettability of the material surface, and improving the wettability of the glass surface plays a crucial role in the bonding between glass and other materials.

Dec. 05, 2025

Inductively Coupled Plasma Reactive Ion Etching Technology (ICP-RIE) - Plasma
Inductively Coupled Plasma Reactive Ion Etching Technology (ICP-RIE) - Plasma Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) technology has been optimized compared to traditional reactive ion etching, achieving more efficient plasma excitation by adding an RF source. The system uses two independent RF sources for plasma generation and etching rate control, significantly improving machining accuracy.

Dec. 01, 2025

Atmospheric plasma treatment of material surfaces
Atmospheric plasma treatment of material surfaces Atmospheric plasma is a plasma generated at atmospheric pressure. There is no complex vacuum system constraint in atmospheric plasma, and the gas pressure is close to atmospheric pressure. Compared with low-pressure plasma material surface treatment technology, it has the advantages of simple structure, low operating cost, and stability.

Dec. 01, 2025

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