Plasma ashing is the process of removing photoresist from etched wafers. The ashing process uses fluorine or oxygen. Our Plasma Asher series provides high-efficiency, solvent-free photoresist removal and surface treatment solutions tailored for the microelectronics, MEMS, display, and laboratory sectors. Built with precision RF plasma technology, these systems are ideal for both production lines and R&D labs seeking clean, uniform, and damage-free ashing.

Applications of Plasma Ashers

Ashing of semiconductor photoresists, peeling of polyimides, etching, cleaning and decontamination of wafers, hydrophilic surface modification, etc.

Technical Highlights 

Ash rate: Up to 10 μm/min (photoresist) depending on gas & power    

Plasma sources: RF (13.56 MHz) or microwave-driven options    

Temperature range: Room temperature to 250°C (depending on system design)    

Chamber sizes: Accommodate 2"–12" wafers or custom substrates    

Process gases: O₂, CF₄, Ar, N₂, with mass flow control    

Industry segmentation of Plasma Ashers

Research, R&D, University, Academic, Medical Devices, MEMS, Photonics, Photovoltaics, Semiconductors, Printed Electronics, etc.

NaenTech Plasma Ashers Quick guide 

NE-PE13F Desktop Plasma Asher: entry level plasma treatment system

NE-Q15HICP Vertical Plasma Asher: wafer stripping or mask removal

NE-PE13FHRF Plasma Asher Machine: processing wafers and silicon wafers for degumming

NE-MW10 Microwave Plasma Asher Equipment: batch wafer degumming and removal of residual glue

NE-RE08 RIE Plasma Asher: photoresist removal and ashing processes of wafers with a diameter of 8 inches or less

Why Choose Naen?

Over 15 years of industry expertise in plasma surface engineering

Modular & scalable designs for R&D and mass production

CE and ISO9001 certified systems with global support

Process development support from our in-house plasma lab

Explore our full range of Plasma Asher systems designed for today's precision cleaning and etching challenges. Whether your goal is to reduce chemical usage, improve uniformity, or meet stricter yield demands, Naen offers a future-ready solution.